In recent years, focused ion beam (FIB) has evolved into a powerful microscopy tool. Creating large FIB cross sections are often required to evaluate materials performance e.g. the depth and morphology of pitting corrosion and stress corrosion cracking. Large FIB sectioning often takes long time that not only occupy valuable FIB microscope time, but also consume often expensive consumables that include Gallium ion source, aperture and deposition gas etc. The new plasma FIB can speed up milling process by using much larger beam current. However, for most of the laboratories that is limited by conventional Ga ion FIB, the milling speed is limited by the relatively small beam current (65 nA for a FEI Helios NanoLab FIB).
In this paper, FIB milling and deposition speeds are studied against milling parameters that include dwell time and pixel overlap. By optimizing the milling parameters, milling speed can improve significantly.