|About this Abstract
||2016 TMS Annual Meeting & Exhibition
||Magnesium Technology 2016
||Atomic-level Mechanisms of Magnesium Oxidation
||Sandra Gardonio, Mattia Fanetti, Dmytro Orlov
|On-Site Speaker (Planned)
Magnesium has been recently becoming an increasingly popular material for various applications. However, excessively fast corrosion, and oxidation rate in particular, is a major obstruction on the way of Mg to become widely adopted. A significant problem causing the lack of Mg corrosion control is insufficient understanding of mechanisms involved in the oxidation of magnesium surface. Herewith we present a comprehensive investigation of atomic-level mechanisms of oxidation initiation and propagation in pure Mg. X-Ray photoelectron spectroscopy at synchrotron Elettra was used as a surface sensitive direct method to determine the valence of Mg and O and valence band states at the early stage of oxide formation over three principal crystallographic planes of pure Mg: (0001), (10-10), (11-20). In addition to clarifying the mechanisms of oxygen adsorption on magnesium free surface followed by oxidation, this study also reveals significant differences in both initiation and kinetics of MgO formation on crystallographic orientation.
||Planned: A combination print-CD volume