|About this Abstract
||2016 TMS Annual Meeting & Exhibition
||Computational Thermodynamics and Kinetics
||A Phase-Field Model for Simulating Microstructure Development during Physical Vapor Deposition of Isotropic Multiphase Polycrystalline Thin Film Systems
||James Stewart, Douglas Spearot
|On-Site Speaker (Planned)
A phase-field model is developed to simulate thin film topology and microstructure evolution during physical vapor deposition (PVD) in isotropic multiphase polycrystalline materials. The proposed model leverages previous phase-field efforts on ballistic deposition, multiphase free energy functionals, and polycrystalline grain evolution. The PVD evolution equations couple thin film growth to an incident vapor field so the film grows at the expense of available vapor. To allow for growth and evolution of multiple phases within the solid, a previously developed free energy functional for multiple phases is coupled to the PVD evolution equations. To capture grain orientation evolution within each phase, a previously developed grain boundary motion and grain rotation model is coupled to multiphase evolution. The unified model is used to simulate PVD growth of a two-phase metallic material to illustrate its capabilities in capturing thin film topology, phase and grain evolution within the microstructure.
||Planned: A print-only volume