|About this Abstract
||Materials Science & Technology 2011
||MS&T'11 Poster Session
||239 Mechanical Properties of Amorphous Carbon Nitride Films According to Deposition Conditions and Post Process
||Sung Pil Lee, Jaehun Jung, Choon Won Chang
|On-Site Speaker (Planned)
Amorphous carbon nitride films were prepared by reactive RF magnetron sputtering system with DC bias at various deposition conditions and post process, and mechanical properties were investigated. Films were grown on polished n-type (100) silicon substrates. The nitrogen content in the films did not vary significantly with the variation of nitrogen gas. Hardness values of the as deposited and annealed samples were measured to show if structural changes had a significant effect on the mechanical properties. Film stress was found to be lower for the nitrogenated films than for pure carbon films. Unlike the film hardness it was found to be independent of the nitrogen content for films with >15 % N. It was also found to be independent of film thickness indicating that the stress was introduced at the film-substrate interface during the initial growth process rather than in the bulk of the film.