| About this Abstract |
| Meeting |
Materials Science & Technology 2012
|
| Symposium
|
Surface Properties of Biomaterials III
|
| Presentation Title |
Surface and Enhanced In-Depth Characterization of Biological and Polymeric Materials Using XPS and Argon Cluster Ion Depth Profiling
|
| Author(s) |
Richard G. White, Tim S. Nunney, Paul Mack, Brian R. Strohmeier |
| On-Site Speaker (Planned) |
Brian R. Strohmeier |
| Abstract Scope |
X-ray photoelectron spectroscopy (XPS) has been used for many years to characterize the surface composition of biological, polymeric, and other organic materials. However, in-depth analysis of such materials by XPS depth profiling using traditional monatomic argon ion sources is usually problematic because of chemical damage caused by the ion beam sputtering process. A recently developed argon cluster ion source was used in this study for soft XPS depth profiling of a variety of biological and organic materials to minimize ion-induced damage during the analyses. Comparisons were made to samples analyzed using monatomic argon ion depth profiling. The materials examined include: a multi-layer amino acid thin film structure; poly(methyl methacrylate) (PMMA) coatings for contact lens; and hydrophobic fluoropolymer plasma coatings for textiles. XPS depth profiling results obtained with the argon cluster ion source were consistent with minimal ion beam damage and preservation of important chemical state information throughout the profiles. |
| Proceedings Inclusion? |
Planned: None Selected |