|About this Abstract
||2016 TMS Annual Meeting & Exhibition
||Nanostructured Materials for Nuclear Applications
||Nanoprecipitates with High Coarsening Resistance in Irradiated Cu-Mo-Si Thin Films
||Jaeyel Lee, John Beach, Pascal Bellon, Robert S Averback
|On-Site Speaker (Planned)
Nanoprecipitation offers an attractive approach for synthesizing materials that can withstand harsh irradiation environments. In past work, we showed that room temperature irradiation of model Cu-based alloys led to precipitation of such immiscible elements as Mo and W and that these precipitates were dimensionally stable at high temperatures. We have extended this approach to the compound-forming Cu-Si-Mo system. Specifically, we find that RT irradiation of Cu90Mo3.5Si6.5 thin films leads to the formation of a high density (>1023 m-3) of ~3 nm Mo-Si clusters. This cluster size remains nearly unchanged on annealing at temperatures as high as 750˚C, in dramatic contrast to a solid solution of unirradiated Cu90Mo3.5Si6.5 subjected to the same annealing treatment. This remarkable coarsening resistance is rationalized on the basis of the precipitate composition, structure, and size distribution derived from RT irradiation. This rationalization suggests how to extend the present results to other compound-forming systems.
||Planned: A print-only volume