|About this Abstract
||1st World Congress on High Entropy Alloys (HEA 2019)
||High Entropy Alloys 2019
||Superhard Nanostructured Thin Films Based on Refractory Type HEA Nitrides
||Joerg Kaspar, Martin Kuczyk, Tim Krülle, Otmar Zimmer, Martina Zimmermann, Christoph Leyens
|On-Site Speaker (Planned)
Despite a great industrial demand for superhard (hardness > 40 GPa) yet tough thin films with high thermal stability (T > 1000°C) such films can currently not be synthesized. By combining the material strategy of HEA nitrides with the design concepts of nanostructured thin films it is assumed that new horizons in the combination of these three criteria can be achieved. In the current work preliminary results for the synthesizing of refractory type HEA nitride system (TiVZrNbMo)N and (TiVZrNbHf)N thin films by means of arc deposition technique are presented. The deposited films were thoroughly characterized by structural analysis (SEM, TEM, EDS, XRD) and first attempts on creating a nano-structuring (nano-layers and nano-composites) proved to be successful. Basic screening tests with regard to the mechanical properties could demonstrate that refractory type HEA nitride thin films are very promising candidates for wear protection under severe conditions.