| About this Abstract |
| Meeting |
2010 TMS Annual Meeting & Exhibition
|
| Symposium
|
Coatings for Structural, Biological, and Electronic Applications
|
| Presentation Title |
An Investigation on Phase Formations and Microstructures of Ni-rich NiTi Shape Memory Alloy Thin Films |
| Author(s) |
B. Geetha Priyadarshini, Shampa Aich, Madhusudan Chakraborty |
| On-Site Speaker (Planned) |
Shampa Aich |
| Abstract Scope |
Ni-rich NiTi alloy thin film of 40 at. % Ti was fabricated by RF/DC magnetron sputtering using elemental Ni and Ti as sputter targets. Si (100) was chosen as substrate which was either held at room temperature or at 300 ºC during the deposition. The 380 nm thick films were characterized by Field Emission Scanning Electron Microscopy, Energy Dispersive Spectroscopy, Grazing Angle X-ray Diffraction, Atomic Force Microscopy and High-Resolution Transmission Electron Microscopy. The results showed that due to lack of surface mobility of the adatoms the room temperature deposited films were smooth, amorphous, with a grain size of 20-25 nm accompanied with porous microstructure. At higher substrate temperatures, increase in the surface diffusion leads to formation of partially crystalline, rougher films with denser, compact, fibrous grains without void boundaries. Formation of Ni-rich precipitates such as: Ni<SUB>4</SUB>Ti<SUB>3</SUB>, Ni<SUB>2</SUB>Ti and Ni<SUB>3</SUB>Ti along with small amount of the NiTi phase were also confirmed. |
| Proceedings Inclusion? |
Planned: Other (describe below) |