|About this Abstract
||2018 TMS Annual Meeting & Exhibition
||Characterization of Minerals, Metals, and Materials
||Surface Damage Layers Produced by Ga Ion and Xe-plasma FIB Milling of Al6061
||Alexis Ernst, Mei Wei, Mark Aindow
|On-Site Speaker (Planned)
Most FIB systems use liquid metal Ga ion sources, but the maximum milling rate that can be achieved is limited. More recently, Xe-plasma sources have been developed for FIB systems; in addition to milling at much higher rates, these plasma FIBs give different surface damage characteristics. There is indirect evidence from EBSD studies that plasma FIB produces less sub-surface disorder during milling of metallic systems, but a direct comparison of the damage layers has only been performed for single-crystal silicon samples. Here we report a study on the damage characteristics for the Al-Mg-Si alloy Al6061. Trenches were milled into the alloy using Ga FIB and Xe plasma FIB under different ion beam conditions. Cross-sectional TEM specimens were then prepared from the trench walls using conventional FIB lift-out techniques. TEM and STEM analyses on these specimens are used to reveal the differences in the thickness and character of the damage layer.
||Planned: None Selected