|About this Abstract
||2017 TMS Annual Meeting & Exhibition
||Frontiers in Materials Science, Engineering, and Technology: An FMD Symposium in Honor of Sungho Jin
||Microstructure and Mechanism Studies of Epitaxial TiN Oxidation in Different Growth Orientations
||Adele Moatti, Jagdish Narayan
|On-Site Speaker (Planned)
We have devised a novel method to create epitaxial heterostructures by oxidation of single-crystal TiN. This paper is focused on designing novel heterostructures with different growth orientations. These heterostructures TiO2(110)/TiN(100)/Si(100) and TiO2(101)/TiN(111)/c-sapphire have been achieved through innovative oxidation of TiN buffer layer and the mechanism behind discovered. The main focus of this study is placed on the growth orientation and oxidation mechanism correlation in TiN based epitaxial heterostructures where the oxidation rate is tuned through microstructural characteristics. The epitaxial growth of TiO2 buffered with TiN through oxidation on different substrates was explained. The Ɵ-2Ɵ and Φ X-Ray diffraction scans, and detailed high resolution electron microscopy studies confirmed the epitaxial growth and crystallographic alignments across the interfaces. Also, it was shown that Ti out-diffusion is a main source of oxidation for both substrates with the aid of high resolution TEM images.
Moatti A, Bayati R, Narayan J. Acta Materialia 2016;103:502.
||Planned: Supplemental Proceedings volume