|About this Abstract
||2017 TMS Annual Meeting & Exhibition
||Advanced Thermo-mechanical Characterization of Materials with Special Emphasis on In Situ Techniques
||Grain Growth and Mechanical Behavior of Nanostructured Intermetallic Films Studied Using In Situ TEM Annealing and Tensile Straining
||Rohit Sarkar, Jagannathan Rajagopalan
|On-Site Speaker (Planned)
The microstructure and mechanical properties of intermetallic films are intimately related and understanding this relationship is critical to elucidate their deformation behavior. We employed in situ TEM annealing and MEMS based tensile straining to uncover the structure-property relationships in intermetallic films. Amorphous thin films of NiTi and TiAl having thin crystalline seed layers of Ti were deposited by sputtering. In situ TEM annealing was carried out to study the effects of the seed layer on the crystallization kinetics and grain growth behavior of the films. The seed layers were found to curtail grain growth and facilitate the development of nanostructured thin films. Using the insights from the in situ annealing experiments, seed layer parameters were varied to control the size, aspect ratio and distribution of the grains. In situ TEM straining showed significant variation in the deformation behavior of films synthesized with different seed layer parameters.
||Planned: Supplemental Proceedings volume